Process for selective, area-wise coating of a transparent carrier plate with a metallic active layer using an etching process, as well as a correspondingly producible layer sequence and counter-embossing film that can be used for this

摘要

The invention relates to a method for the selective, area-wise coating of a transparent carrier plate with a metallic active layer using an etching process in which the metallic active layer and in areas to be coated with the metallic active layer a cover layer are applied, whereupon the metallic active layer in the areas not covered by the cover layer is etched away, the metal active layer being embossed over the entire surface of the carrier plate via a counter-embossing film at least in an area which comprises the areas to be coated with the metal active layer, the cover layer in the form of a first color layer directly on the metal Active layer is applied on the side of the metallic active layer facing away from the carrier plate, and essentially only the metallic active layer is etched away in the areas not covered by the cover layer; as well as a layer sequence that can be produced afterwards and a counter-stamping foil that can be used for this.