A process for the preparation of a deflection aperture matrix for electron beam - exposure devices, wet etching process and - an apparatus for making of the aperture matrix and electron beam - illumination device with the aperture matrix

摘要

A process for the production of a deflection aperture matrix in an electron beam - illumination device and a wet etching process and a wet etching apparatus for the preparation of the impingement aperture matrix are disclosed. In the case of the wet etching of a substrate for the aperture matrix is a tensioning device as a holder for the substrate used in such a way that only a portion of the rear side to be etched is subjected to an etching solution, so that the surface protection film can be removed before the wet etching. According to the wet etching process, a gas in an enclosed space which is connected to a not - etched surface is connected, is initiated or discharged, as a result of which the internal pressure of the enclosed space is set. The internal pressure of the enclosed space is measured and in accordance with the determined pressure in the case of a preset value.