Modified microwave plasma-CVD, e.g. of diamond layers on large surfaces such as window panes, involves using one or more separate electron sources for plasma stabilization by electron emission

摘要

Plasma-chemical deposition involves using a microwave gas discharge assisted by electron emission from one or more separate electron sources. An Independent claim is also included for a plasma-chemical deposition apparatus comprising a vacuum chamber (20), a quartz glass window (25) for microwave power coupling and one or more separate electron source grids (40). Preferred Features: Microwave discharge is produced in a gas atmosphere containing -90% hydrogen and = 10% methane or other hydrocarbon.