首页> 外国专利> HEMT component on InP base with Schottky barrier with variable aluminium percentage content has lower layer with first aluminium content, per layer with higher concentration region

HEMT component on InP base with Schottky barrier with variable aluminium percentage content has lower layer with first aluminium content, per layer with higher concentration region

机译:InP基上的HEMT组分具有可变的铝百分比含量的肖特基势垒,具有较低的第一铝含量层,每层具有较高的浓度区域

摘要

The component has a lower layer composed of a first material with a first percentage aluminium content and an upper layer arranged on the lower layer, whereby one region of the upper layer is made up of a second material with a second percentage aluminium content greater than the first. The aluminium content in the upper layer varies over the thickness of the upper layer from a first value near the lower layer to a second value close to the second percentage content at a distance from the lower layer. Independent claims are also included for a Schottky barrier, a method of producing a Schottky barrier, and a method of manufacture of a HEMT
机译:该部件具有一个下层,该下层由铝含量为第一百分比的第一材料组成,并且上层布置在该下层上,其中上层的一个区域由第二材料制成,该第二材料的铝含量为第二百分比大于该铝含量。第一。上层中的铝含量在上层的厚度上从下层附近的第一值变化到在与下层一定距离处接近第二百分比含量的第二值。还包括肖特基势垒,肖特基势垒的制造方法以及HEMT的制造方法的独立权利要求。

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