首页> 外国专利> Device for the removal of semiconductor wafers from the rotor - disks in a double - polishing machine

Device for the removal of semiconductor wafers from the rotor - disks in a double - polishing machine

机译:在双抛光机中从转子盘上去除半导体晶片的装置。

摘要

An apparatus for removing semiconductor wafers from within the runner disks in a double-sided polishing machine. The apparatus includes a suction head adapted to be connected to a vacuum, which has a plurality of suction ports such that all semiconductor wafers received by a runner disk may be gripped simultaneously. The apparatus also includes an arm on which the suction head is rotatably supported about a vertical axis and which, in turn, is pivotally supported about a vertical axis at a spacing from the suction head or is supported so as to be linearly adjustable or adjustable in height. The apparatus also includes a rotary drive for the suction head, a drive for the arm, a lifting drive for the arm, and a control device for activating the drives such that the semiconductor wafers may be deposited on a lay-down device in a predetermined, aligned position.
机译:一种用于在双面抛光机中从流道盘内去除半导体晶片的设备。该设备包括适于连接到真空的抽吸头,该抽吸头具有多个抽吸端口,使得由流道盘接收的所有半导体晶片可以同时被夹持。该设备还包括臂,在该臂上吸头围绕竖直轴线可旋转地支撑,并且该臂又围绕竖直轴以与吸头间隔开的方式枢转地支撑或者被支撑为可线性调节或可调节。高度。该设备还包括用于吸头的旋转驱动器,用于臂的驱动器,用于臂的提升驱动器,以及用于致动驱动器的控制装置,使得半导体晶片可以预定的方式沉积在放下装置上。 ,对齐的位置。

著录项

  • 公开/公告号DE20004223U1

    专利类型

  • 公开/公告日2000-08-24

    原文格式PDF

  • 申请/专利权人 PETER WOLTERS WERKZEUGMASCHINEN GMBH;

    申请/专利号DE2000204223U

  • 发明设计人

    申请日2000-02-18

  • 分类号H01L21/68;H01L21/304;B24B37/04;

  • 国家 DE

  • 入库时间 2022-08-22 01:41:47

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号