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Improvements in and relating to a method for improving the sputter deposition of metal - sulphur - coatings, for example, the molybdenum disulfide, coatings and improved coatings
Improvements in and relating to a method for improving the sputter deposition of metal - sulphur - coatings, for example, the molybdenum disulfide, coatings and improved coatings
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机译:改进和涉及改进金属-硫-涂层(例如二硫化钼)的溅射沉积的方法的方法,涂层和改进的涂层
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摘要
An unbalanced magnetron sputter ion plating system (10) has a first magnetron (16) with a first target (18) of metal sulphide (e.g. MoS2) and a second magnetron (20) with a second target (22) of metal (e.g. Titanium). In order to recover water and sulphur impurities from the surfaces of the coating chamber the metal target is energised in a pre-coating ion cleaning operation. Metal atoms getter the impurities and allow for better coatings, especially low friction MoS2 coatings. Apparatus for achieving multi-layer coatings is disclosed. The coatings have low friction, good adhesion, and high hardness.
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