首页> 外国专利> Improvements in and relating to a method for improving the sputter deposition of metal - sulphur - coatings, for example, the molybdenum disulfide, coatings and improved coatings

Improvements in and relating to a method for improving the sputter deposition of metal - sulphur - coatings, for example, the molybdenum disulfide, coatings and improved coatings

机译:改进和涉及改进金属-硫-涂层(例如二硫化钼)的溅射沉积的方法的方法,涂层和改进的涂层

摘要

An unbalanced magnetron sputter ion plating system (10) has a first magnetron (16) with a first target (18) of metal sulphide (e.g. MoS2) and a second magnetron (20) with a second target (22) of metal (e.g. Titanium). In order to recover water and sulphur impurities from the surfaces of the coating chamber the metal target is energised in a pre-coating ion cleaning operation. Metal atoms getter the impurities and allow for better coatings, especially low friction MoS2 coatings. Apparatus for achieving multi-layer coatings is disclosed. The coatings have low friction, good adhesion, and high hardness.
机译:不平衡磁控溅射离子镀系统(10)具有带金属硫化物(例如MoS2)的第一靶(18)的第一磁控管(16)和具有金属(例如钛)的第二靶(22)的第二磁控管(20) )。为了从涂覆室的表面回收水和硫杂质,在预涂覆离子清洁操作中向金属靶通电。金属原子吸收杂质并获得更好的涂层,尤其是低摩擦MoS2涂层。公开了用于获得多层涂层的设备。涂层具有低摩擦,良好的附着力和高硬度。

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