Integrated optical circuit production comprises using a common waveguide mask and defining a buried ridge stripe type waveguide and a non-buried ridge type waveguide by successive etching

摘要

An integrated optical circuit production process, comprising using a common waveguide mask and definition of a buried ridge stripe (BRS) type waveguide and a non-buried ridge type waveguide by successive etching. Production of an integrated optical circuit, having a BRS type waveguide coupled to a non-buried ridge type waveguide, comprises: (a) forming first and second zones, each having buried and butt coupled first and second guide layers, on a substrate; (b) forming a waveguide pattern mask on the two zones; (c) protecting the second zone with a second mask and etching the first zone to define the BRS type waveguide; (d) removing the second mask and growing a layer on both zones to form a confinement layer, which buries the BRS type waveguide in the first zone, and to form an upper layer on the second zone; and (e) protecting the first zone with a third mask, etching away the upper layer in the second zone and then using the first mask for etching the second zone to define the ridge type waveguide. Preferred Features: The first mask consists of one or more layers of refractory metal selected from Ti, W, Mo and their alloys.