Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source

摘要

Charged-particle-beam (CPB) lithography apparatus are disclosed that provide high accuracy in forming, by projection exposure using a charged particle beam, a pattern on a sensitive substrate at high throughput. The apparatus comprise a cathode having a work function of 2. 65 eV or less within a space-charge limitation region. The temperature of the cathode is controlled within a range of 1,200 to 1,400° C.