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Cleaning device, cleaning device for developing processing apparatus, drying device, and drying device for developing processing apparatus

机译:清洁装置,用于显影处理装置的清洁装置,干燥装置以及用于显影处理装置的干燥装置

摘要

According to the invention, only the surface where washing is necessary can be washed with a simple configuration, and a high humidity adhesion property of the heat developing photosensitive material after the heat developing processing can be eliminated regardless of the degree of the humidity. A pair of guiding rollers are provided above a water washing roller. The guiding rollers are provided such that the lowermost points are below the uppermost point of the water washing roller. The water washing roller rotates while rubbing the lower surface of a film. Washing water is taken out toward the transported film by the water washing roller by the high speed rotation thereof (400 rpm) so as to form a flow on the upstream side with respect to the contacting portion with the film at the uppermost point. The lower surface of the film is washed off by the flow which washes off salts having a high humidity adhesion property and the washing water taken out does not reach the downstream side of the water washing roller 216.
机译:根据本发明,可以以简单的构造仅对需要清洗的表面进行清洗,并且可以在不考虑湿度的情况下消除热显影处理之后的热显影感光材料的高湿度粘附性。在水洗辊上方设置有一对引导辊。引导辊设置成使得最低点在水洗辊的最高点的下方。水洗辊在摩擦膜的下表面的同时旋转。洗水辊通过其高速旋转(400rpm)而朝着被输送的膜朝向被输送的膜取出洗涤水,从而在相对于与膜的最高点的接触部分的上游侧形成流动。膜的下表面通过洗去具有高湿度粘附性的盐而被洗掉,并且取出的洗净水没有到达水洗辊216的下游侧。

著录项

  • 公开/公告号US6139204A

    专利类型

  • 公开/公告日2000-10-31

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO FILM CO. LTD.;

    申请/专利号US19980041738

  • 发明设计人 TAKAO OZAKI;

    申请日1998-03-13

  • 分类号G03D13/00;G03D5/00;

  • 国家 US

  • 入库时间 2022-08-22 01:35:51

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