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Cleaning device, cleaning device for developing processing apparatus, drying device, and drying device for developing processing apparatus
Cleaning device, cleaning device for developing processing apparatus, drying device, and drying device for developing processing apparatus
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机译:清洁装置,用于显影处理装置的清洁装置,干燥装置以及用于显影处理装置的干燥装置
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摘要
According to the invention, only the surface where washing is necessary can be washed with a simple configuration, and a high humidity adhesion property of the heat developing photosensitive material after the heat developing processing can be eliminated regardless of the degree of the humidity. A pair of guiding rollers are provided above a water washing roller. The guiding rollers are provided such that the lowermost points are below the uppermost point of the water washing roller. The water washing roller rotates while rubbing the lower surface of a film. Washing water is taken out toward the transported film by the water washing roller by the high speed rotation thereof (400 rpm) so as to form a flow on the upstream side with respect to the contacting portion with the film at the uppermost point. The lower surface of the film is washed off by the flow which washes off salts having a high humidity adhesion property and the washing water taken out does not reach the downstream side of the water washing roller 216.
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