PURPOSE:To improve throughput of the entire charged beam lithography system by devising data creating method of parallel processing unit for optimizing data composition thereby realizing high speed conversion of parallel data. CONSTITUTION:In a method for preparing charged beam lithography data which can be inputted from design pattern data of LSI to a charged beam lithography system, the design pattern data are split into small blocks 1, 2, 3 having no correlation. A plurality of blocks are then collected into a processing unit and a virtual grid having size equal to the sub-deflection region (sub-field) of the aligner is set a data space 6 constituting the unit thus arranging the blocks 1, 2, 3 according to the grid so that the regions of the blocks do not overlap. The design pattern data are then converted into lithography data for each unit and the plurality of units are processed in parallel.
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