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Central processing unit null of porous tube condition suffering treatment backing material and its treatment manner and porous tube condition suffering treatment

机译:中央处理单元多孔管状态受治衬材及其处理方式和多孔管状态受治

摘要

PURPOSE: To apply glow discharge plasma treatment to a perforated tubular article composed of a plastic material or the like under atmospheric pressure by applying AC voltage while introducing gas, treatment gas or mixed gas of them generating glow discharge stably. ;CONSTITUTION: After the base material to be treated (e.g., tube of two-hole structure) opened to the atmosphere at one end thereof and connected to a gas introducing line 6 at the other end thereof is set to the inside of an electrode main body 1, the mass flow control valves 5a, 5b provided to gas introducing lines 6a, 6b are opened to continuously introduce mixed gas consisting of gas A stabilizing glow discharge and treatment gas B into the base material 4 to be treated and AC voltage is applied under pressure near to atmospheric pressure to form a glow plasma region to perform treatment. The mass flow control valves 5a, 5b adjust the introducing amt. of the treatment gas and gas stably generating low discharge such as helium introduced into the holes of the base material 4 to be treated and the mixing ratio of them.;COPYRIGHT: (C)1996,JPO
机译:用途:通过在施加气体,处理气体或它们的混合气体稳定地产生辉光放电的同时施加交流电压,在大气压下对由塑料等构成的多孔管状制品进行辉光放电等离子体处理。 ;构成:将要处理的基材(例如,两孔结构的管)的一端敞开并与另一端的气体引入管线6相连后,将其置于电极主体内部在主体1上,打开设置在气体导入管线6a,6b上的质量流量控制阀5a,5b,将由稳定辉光放电的气体A和处理气体B构成的混合气体连续地导入到被处理基材4中,并施加交流电压。在接近大气压的压力下形成辉光等离子体区域以进行处理。质量流量控制阀5a,5b调节引入量。处理气体和稳定产生低排放气体的气体(如氦气)引入待处理基材4的孔中以及它们的混合比。;版权所有:(C)1996,日本特许厅

著录项

  • 公开/公告号JP3212822B2

    专利类型

  • 公开/公告日2001-09-25

    原文格式PDF

  • 申请/专利权人 川澄化学工業株式会社;

    申请/专利号JP19940340317

  • 发明设计人 野見山 弘章;廣田 茂;

    申请日1994-12-29

  • 分类号B29C71/04;C08J7/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:35:14

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