首页>
外国专利>
Figure collective electron beam drawing mask, figure collective electron beam drawing mask creation method, and figure collective electron beam drawing apparatus
Figure collective electron beam drawing mask, figure collective electron beam drawing mask creation method, and figure collective electron beam drawing apparatus
展开▼
机译:图形集合电子束描绘掩模,图形集合电子束描绘掩模制作方法以及图形集合电子束描绘装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention consists in a method of creating an EB mask for electron beam image drawing, comprising: a step of extracting patterns for forming on an EB mask from design data stored in means for storage; a step of calculating an aperture area of an aperture section requested in an EB mask, using the design data contained in the extracted cell; a step of generating cell data for aperture creation using the value of this aperture area; and a step of forming a basic aperture pattern in an EB mask using this cell data for aperture creation.
展开▼