Formation manner null of the constituent and the silica glass type inorganic film which include silicone resin

摘要

PURPOSE:To obtain a silicone resin capable of forming films with good thermal stability under mild conditions when mixed with an acid generator and applied to a base material, consisting of a poly(siloxane) with part of the substituents being butoxyl groups and the rest hydroxyl groups. CONSTITUTION:This silicone resin consists of a poly(siloxane) with all of the substituents being either t-alkoxyl, alpha-substituted aryloxyl, alpha, alpha-disubstituted aryloxyl, (substituted) tetrahydropyranyloxyl, 2-alkoxyethoxyl, 2-aryloxyethoxyl or 2-alkanoyloxyethoxyl groups another version of this silicone resin consists of a poly(siloxane) with part of the substituents being either of the above- mentioned ones and the rest hydroxyl groups. The other objective composition is obtained by incorporating this silicone resin with an acid generator and a boric ester and a phosphoric ester.