首页> 外国专利> SURFACE TREATMENT METHOD FOR MAKING BASE HYDROPHOBIC, BASE WITH HYDROPHOBIC SURFACE, SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL FOR HEAT DEVELOPMENT AND METHOD FOR PRODUCING THE SAME

SURFACE TREATMENT METHOD FOR MAKING BASE HYDROPHOBIC, BASE WITH HYDROPHOBIC SURFACE, SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL FOR HEAT DEVELOPMENT AND METHOD FOR PRODUCING THE SAME

机译:制备碱疏水性,具有疏水性表面的碱,用于热发展的卤化银照相感光材料的表面处理方法及其制备方法

摘要

PROBLEM TO BE SOLVED: To provide a method for treating a base so that the base and a silver halide photosensitive layer for heat development do not peel from each other even under cutting energy, the base and a silver halide photographic sensitive material for heat development.;SOLUTION: In the surface treatment method for making a base hydrophobic, the base is continuously conveyed and at least one face of the base is treated with plasma by electric discharged in a gas under atmospheric pressure or a pressure close to it. An inert gas containing ≥50% gaseous argon is introduced and a gaseous hydrocarbon and/or a gaseous fluorohydrocarbon is incorporated as a reactive gas.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种处理基材的方法,以使基材和用于热显影的卤化银感光层即使在切割能量下也不会彼此剥离,该基材和用于显影的卤化银照相感光材料。 ;解决方案:在用于使基材疏水的表面处理方法中,连续输送基材,并通过在大气压或接近其压力的气体中放电,通过等离子体对基材的至少一个面进行等离子体处理。引入一种惰性气体,其中含有50%以上的气态氩,并掺入气态烃和/或气态氟代烃作为反应性气体。;版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP2001255625A

    专利类型

  • 公开/公告日2001-09-21

    原文格式PDF

  • 申请/专利权人 KONICA CORP;

    申请/专利号JP20000066778

  • 发明设计人 OISHI KIYOSHI;FUKUDA KAZUHIRO;

    申请日2000-03-10

  • 分类号G03C1/76;C08J7/00;G03C1/498;G03C1/74;

  • 国家 JP

  • 入库时间 2022-08-22 01:33:05

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