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POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, MODIFIED POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, MODIFIED POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
PROBLEM TO BE SOLVED: To obtain a polyvinyl acetal resin for a heat-developable photosensitive material which improves the pot life of a solution before coating and the preservability, fog, etc., of a raw film and can improve the definition of an image and of a gradation part, a modified polyvinyl acetal resin for a heat- developable photosensitive material, and a heat developable photosensitive material.;SOLUTION: The polyvinyl acetal resin is synthesized by the acetalizing reaction of a polyvinyl alcohol with an aldehyde, has a polymerization degree of 200-3,000, contains 0-25 mol% residual acetyl groups and 17-35 mol% residual hydroxyl group when one acetal group is counted as two acetalized hydroxyl groups, does not contain an antioxidant and has ≤100 ppm residual halide content.;COPYRIGHT: (C)2001,JPO
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