POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, MODIFIED POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL, AND HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL

摘要

PROBLEM TO BE SOLVED: To obtain a polyvinyl acetal resin for a heat-developable photosensitive material which improves the pot life of a solution before coating and the preservability, fog, etc., of a raw film and can improve the definition of an image and of a gradation part, a modified polyvinyl acetal resin for a heat- developable photosensitive material, and a heat developable photosensitive material.;SOLUTION: The polyvinyl acetal resin is synthesized by the acetalizing reaction of a polyvinyl alcohol with at least one compound selected from the group comprising aldehyde, butylaldehyde and acetaldehyde, has a polymerization degree of 200-3,000, does not contain an antioxidant and has ≤100 ppm residual halide content.;COPYRIGHT: (C)2001,JPO