首页> 外国专利> RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING INORGANIC FORMED ARTICLE, INORGANIC FORMED ARTICLE, AND PRODUCTION METHOD THEREFOR

RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING INORGANIC FORMED ARTICLE, INORGANIC FORMED ARTICLE, AND PRODUCTION METHOD THEREFOR

机译:用于生产无机仿制品的辐射敏感树脂组合物,无机仿制品及其生产方法

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is used for producing an inorganic formed article, can form a fine pattern uniformly in a good shape, exhibits a very small shrinkage in a coating film section when the inorganic formed article is produced, and enables the positioning of viaholes in laminating ceramics green sheets to be accurately carried out.;SOLUTION: This resin composition contains (A) a polymer which has aciddissociable functional groups dissociable by an acid to form acidic functional groups, (B) a component which generates an acid when exposed to a radiation, and (C) an inorganic powder. The resin composition is applied to a carrier, dried, irradiated with a radiation in a certain pattern, heated, developed to be formed, and baked to give the objective inorganic molded item.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种用于生产无机成型品的放射线敏感性树脂组合物,当该无机成型品被制成时,其可以均匀地形成良好形状的精细图案,并且在涂膜部分表现出非常小的收缩。 SOLUTION:该树脂组合物包含(A)一种具有酸可分解的官能团的聚合物,该聚合物可被酸分解形成酸性官能团,(B)a当暴露于辐射时会产生酸的成分,以及(C)无机粉末。将该树脂组合物涂布到载体上,干燥,以一定的图案照射放射线,加热,显影形成,然后烘烤,得到目标无机成型体。版权所有:(C)2001,日本特许厅

著录项

  • 公开/公告号JP2001172512A

    专利类型

  • 公开/公告日2001-06-26

    原文格式PDF

  • 申请/专利权人 JSR CORP;

    申请/专利号JP19990361341

  • 申请日1999-12-20

  • 分类号C08L101/02;C04B35/632;C04B41/87;C08K3/00;C08K5/00;C08K7/00;

  • 国家 JP

  • 入库时间 2022-08-22 01:30:34

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