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COPPER CHLORIDE ETCHING SOLUTION ELECTROLYTIC REGENERATION SYSTEM

机译:氯化铜蚀刻液电解再生系统

摘要

PROBLEM TO BE SOLVED: To provide an improvement type electrolytic regeneration treatment system by which the precipitating state of copper powder is fixed, and the scraping-off of the copper powder from a cathode plate and the exhaust of the copper powder from a cathode chamber can stably be executed. ;SOLUTION: A solution return path from an electrolytic cell 2 to an etching cell 1 is arranged with a return solution cell 4, a solution exhausted from an anode chamber is temporarily retained in the return solution cell, moreover, a cathode chamber 23 of the electrolytic cell is provided with a solution face level detecting means 16, based on the detected result from the solution face level detecting means, a part of the solution retained in the return solution cell is returned to the cathode chamber, and the solution face level of the cathode chamber is controlled to a fixed range.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种改进型的电解再生处理系统,通过该系统,可以固定铜粉的沉淀状态,并且可以将铜粉从阴极板上刮下来,并将铜粉从阴极腔室中排出。稳定地执行。 ;解决方案:从电解池2到蚀刻池1的溶液返回路径上设置有返回溶液池4,从阳极室排出的溶液暂时保留在该返回溶液池中,此外,该溶液的阴极室23电解池设置有溶液面液位检测装置16,基于溶液面液位检测装置的检测结果,保留在返回溶液池中的溶液的一部分返回到阴极室,并且阴极室控制在固定范围内。版权所有:(C)2001,日本特许厅

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