首页> 外国专利> FLUID TRANSFERRING PIPING DEVICE AND FLUID SUPPLY DEVICE WHICH FACILITATE PURGING OF RESIDUAL MATERIAL, PURGING METHOD FOR RESIDUAL MATERIAL IN PIPING DEVICE, AND FLUID SUPPLY METHOD

FLUID TRANSFERRING PIPING DEVICE AND FLUID SUPPLY DEVICE WHICH FACILITATE PURGING OF RESIDUAL MATERIAL, PURGING METHOD FOR RESIDUAL MATERIAL IN PIPING DEVICE, AND FLUID SUPPLY METHOD

机译:便于残留物质的流体输送配管装置及流体供给装置,配管装置中的残留物质的冲洗方法及流体供给法

摘要

PROBLEM TO BE SOLVED: To provide a piping device and fluid supply device which can easily purge residual material and used suitably for supplying semiconductor material fluid, purging method for the residual material in the piping device and fluid supply method. ;SOLUTION: A three-port valve is adopted to a valve used in the vicinity of a joint connecting a vessel to piping. Communication of the two ports is kept even when the valve is closed. It is thus possible to make purging fluid pass through a dead space which is inevitably generated in a conventional piping structure, and easily eliminate residual material in the piping device. As a result, it is possible to provide a new piping device and a fluid supply device showing high efficiency in purging, and purging method for the residual material using the same and fluid supply method.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种管道装置和流体供应装置,其能够容易地清除残留材料并且适合用于供应半导体材料流体,该管道装置中的残留材料的净化方法和流体供应方法。 ;解决方案:在将容器连接到管道的接头附近使用的阀门采用三通阀。即使关闭阀门,两个端口仍保持连通。因此,可以使清洗流体流过在常规管道结构中不可避免地产生的死空间,并且可以容易地消除管道设备中的残留材料。结果,可以提供一种新型的管道装置和流体供应装置,其显示出高的净化效率,以及使用该管道装置和流体供应装置的残留材料的净化方法和流体供应方法。COPYRIGHT:(C)2001,JPO

著录项

  • 公开/公告号JP2001108199A

    专利类型

  • 公开/公告日2001-04-20

    原文格式PDF

  • 申请/专利权人 TORI CHEMICAL KENKYUSHO:KK;

    申请/专利号JP19990290091

  • 发明设计人 OGAWA TOMOKAZU;

    申请日1999-10-12

  • 分类号F17C13/04;B01J4/00;C23C16/455;H01L21/205;H01L21/31;

  • 国家 JP

  • 入库时间 2022-08-22 01:30:24

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