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VACUUM ULTRAVIOLET-RAY LITHOGRAPHY DEVICE, ITS MANUFACTURE, AND METHOD FOR INSPECTING CRYSTALLINE FLUORIDE MATERIAL
VACUUM ULTRAVIOLET-RAY LITHOGRAPHY DEVICE, ITS MANUFACTURE, AND METHOD FOR INSPECTING CRYSTALLINE FLUORIDE MATERIAL
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机译:真空紫外线光刻设备,其制造方法以及晶体氟化物材料的检查方法
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摘要
PROBLEM TO BE SOLVED: To predict degradation quantity in transmittance of a plurality of crystalline fluoride materials caused by vacuum ultraviolet rays, by classifying the fluoride crystal materials based on the degradation quantity in transmittance of the materials caused by ArF excimer laser light, and arranging the classified materials in accordance with the fluence of the light projected upon each optical member.;SOLUTION: The deteriorated transmittance amounts of three kinds of calcium fluoride crystals containing an impurity at different concentrations are measured by projecting ArF excimer laser light upon each crystal. The laser light is projected by 10,000 pulses under the condition of 100 mJ/cm2/pulse in fluence and the transmittance variation of the crystals at 193 nm is measured by using a spectrophotometer. For another three kinds of samples, the transmittance variation of the samples at 157 nm is measured by projecting F2 laser light upon each sample. Then the correlations between the degradation quantity in transmittance at 193 nm caused by the ArF excimer laser light and those at 157 nm caused by the F2 laser light are found, so that the degradation quantity in transmittance of the calcium fluoride crystals may be predicted from the degradation quantity in transmittance of the crystals at 193 nm.;COPYRIGHT: (C)2001,JPO
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机译:解决的问题:通过基于由ArF准分子激光引起的材料的透射率的衰减量进行分类,以预测由真空紫外线引起的多种结晶氟化物材料的透射率的衰减量,并安排解决方案:通过将ArF受激准分子激光投射到每个晶体上,来测量三种包含不同浓度杂质的氟化钙晶体的透射率降低量。在注量为100mJ / cm 2 /脉冲的条件下以10,000个脉冲投射激光,并且使用分光光度计测量晶体在193nm的透射率变化。对于另外三种样品,通过将F2激光投射到每个样品上来测量157 nm下样品的透射率变化。然后发现ArF准分子激光在193 nm处的透射率下降量与F2激光在157 nm处的透射率下降量之间的相关性,从而可以从晶体中预测氟化钙晶体的透射率的下降量。 193nm处晶体透射率的降低量。;版权所有:(C)2001,日本特许厅
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