首页> 外国专利> MONITORING METHOD FOR BEAM PROFILE AND MULTI-WIRE BEAM PROFILE MONITOR

MONITORING METHOD FOR BEAM PROFILE AND MULTI-WIRE BEAM PROFILE MONITOR

机译:光束轮廓和多线束轮廓监测器的监测方法

摘要

PROBLEM TO BE SOLVED: To provide a multi-wire beam profile monitor capable of precisely monitoring the beam current without being affected by the unstable electrostatic capacity of the capacitor for storing the beam current.;SOLUTION: The electrostatic capacity of the capacitor C1 is obtained from the voltage measured by the cycles, one of which is a pre-charge measuring cycle to measure the capacitor terminal voltage when the discharge is done for the prescribed time after the capacitor C1 provided for the wire electrode Wi is charged up to the prescribed voltage, and the other one of which is an electrostatic capacity measuring cycle to measure the capacitor terminal voltage when discharge is done for the prescribed time after the capacitor C1 is charged up with the prescribed current. The beam profile is monitored without receiving the influence of the unstable electrostatic capacity of the capacitor, by utilizing the arithmetic operation of the beam current caught by means of the electrostatic capacity.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:提供一种多线束轮廓监测仪,该监视器能够精确地监测束流,而不受用于存储束流的电容器的不稳定静电容量的影响;解决方案:获得电容器C1的静电容量从通过周期测得的电压开始,该周期之一是预充电测量周期,用于测量设置在导线电极Wi上的电容器C1充电到规定电压后在规定时间内进行放电时的电容器端子电压另一个是静电电容测量周期,该静电电容测量周期用于在电容器C1用规定电流充电之后的规定时间进行放电时测量电容器端子电压。通过利用借助于静电电容捕获的电子束电流的算术运算,可以监视电子束轮廓,而不会受到电容器的不稳定静电电容的影响。;版权所有:(C)2001,JPO

著录项

  • 公开/公告号JP2001236909A

    专利类型

  • 公开/公告日2001-08-31

    原文格式PDF

  • 申请/专利权人 NISSIN HIGH VOLTAGE CO LTD;

    申请/专利号JP20000043956

  • 发明设计人 KANEKO HIROMI;KIMURA TOSHIO;

    申请日2000-02-22

  • 分类号H01J37/04;G01B7/28;

  • 国家 JP

  • 入库时间 2022-08-22 01:29:03

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号