MASTER DISK EXPOSURE DEVICE AND MASTER DISK EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a master disk exposure device which can bake the photoresist on a master disk uniformly over the entire circumference thereof and master disk exposure method. ;SOLUTION: A head section 53 of the exposure device is provided with an objective lens 11 for condensing exposure light and irradiating the master disk with the condensed light and is provided with an IR heater 13 for heating the photoresist. The IR heater 13 is disposed adjacently to the objective lens 11 in a direction where the objective lens 11 moves relatively to the master disk 10 in exposure. As a result, the heating of the exposed region with the IR heater 13 is made possible while the photoresist is exposed at desired patterns by the exposure light. The time when the photoresist is subjected to a chemical reaction is made equal over the entire circumference.;COPYRIGHT: (C)2001,JPO