首页> 外国专利> INORGANIC COMPOUND THIN FILM AND METHOD FOR DEPOSITION OF INORGANIC COMPOUND THIN FILM, DISK-SHAPED SUBSTRATE, MAGNETIC RECORDING MEDIUM, PRODUCTION OF MAGNETIC RECORDING MEDIUM AND MAGNETIC DISK DEVICE

INORGANIC COMPOUND THIN FILM AND METHOD FOR DEPOSITION OF INORGANIC COMPOUND THIN FILM, DISK-SHAPED SUBSTRATE, MAGNETIC RECORDING MEDIUM, PRODUCTION OF MAGNETIC RECORDING MEDIUM AND MAGNETIC DISK DEVICE

机译:无机复合薄膜,无机复合薄膜,盘状基质,磁记录介质,磁记录介质的生产和磁碟装置的沉积方法

摘要

PROBLEM TO BE SOLVED: To form desired ruggedness on a disk substrate, to lessen the generation of noise by suppressing the dispersion of crystal particle sizes in a magnetic film, lessening the generation of noise by pulverization and reducing these sizes, to obtain low noise, low thermal fluctuation and low thermal degaussing by suppressing the dispersion of the crystal particle sizes, to facilitate the formation of micromagnetic domains and to allow these magnetic domains to stably exist by controlling the orientability of the magnetic film and to obtain an ultra-high density magnetic recording medium in excess of 40 GB/inch2.;SOLUTION: This inorganic compound thin film is composed of the crystalline particles and the amorphous materials enclosing the same. The crystalline particles are regular hexagonal, a two-dimensionally regularly arrayed and have a honeycomb structure. The distance from the projecting parts on the surface of the inorganic compound this film 2 to the parallel direction up to the projecting parts nearest these projecting parts and the distance in a perpendicular direction from the projecting parts on the surface of the inorganic compound thin film 2 to the recessed parts nearest these projecting parts are specified ≤20 nm in the surface smoothness of the inorganic compound thin film 2.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:为了在磁盘基板上形成所需的坚固性,通过抑制磁性膜中晶粒尺寸的分散来减少噪声的产生,通过粉碎减少噪声的产生并减小这些尺寸,以获得低噪声,通过抑制晶体粒径的分散来实现低热波动和低热消磁,从而有利于形成微磁畴,并通过控制磁性膜的取向性而使这些磁畴稳定地存在,从而获得超高密度的磁记录介质的容量超过40 GB / inch2 。;解决方案:该无机化合物薄膜由晶体颗粒和包围该晶体的非晶材料组成。结晶颗粒是规则的六边形,二维规则地排列并且具有蜂窝结构。从无机化合物薄膜2的表面上的突出部分到平行方向的距离,直到最靠近这些突出部分的突出部分的距离,以及从无机化合物薄膜2的表面上的突出部分在垂直方向上的距离。距这些突出部分最近的凹入部分的无机化合物薄膜2的表面光滑度指定为≤ 20 nm。; COPYRIGHT:(C)2000,JPO

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