improved process for the recrystallization of amorphous silicon films by laser irradiation in two sequential stages by

• 1. 具有两个焊炬和用于启动电弧点火阶段的控制单元的焊接设备以及在适合的启动过程利用两个焊接工艺进行焊接的焊接方法 [P] . 中国专利： CN104203474B . 2017.04.05
• 2. 具有两个焊炬和用于启动电弧点火阶段的控制单元的焊接设备以及在适合的启动过程利用两个焊接工艺进行焊接的焊接方法 [P] . 中国专利： CN104203474A . 2014-12-10
• 3. improved process for the recrystallization of amorphous silicon films by laser irradiation in two sequential stages by [P] . ITRM990381D0 . 1999-06-11

  机译： 通过连续两个阶段的激光照射对非晶硅膜进行重结晶的改进方法

• 4. process of recrystallization of amorphous silicon films by laser irradiation in two sequential stages and the use of a mask. [P] . ITRM990182A1 . 2000-09-25

  机译： 分两个连续阶段通过激光辐照使非晶硅膜重结晶的过程。

• 5. improved process for the recrystallization of amorphous film disilicio by irradiation laser in two sequential stages [P] . IT1306708B1 . 2001-10-02

  机译： 在两个连续阶段中，通过辐照激光对非晶膜非晶性再结晶的改进方法

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• 4. Characterization of recrystallization behaviour of amorphous-Si films using ArF excimer laser irradiation technique [C] . T.T. Chen, C.Y. Chang, C.L. Chao, International Conference of the European Society for Precision Engineering and Nanotechnology vol.2; 20060528-0601; Vienna(AT) . 2006
• 5. Techniques and diagnostics on laser recrystallization of thin amorphous silicon films for flat panel display applications. [D] . Lee, Ming-Hong. 2001
• 6. Large-Scale and Localized Laser Crystallization of Optically Thick Amorphous Silicon Films by Near-IR Femtosecond Pulses [O] . Kirill Bronnikov, Alexander Dostovalov, Artem Cherepakhin, 2020
• 7. Situ Visualization of Interface Dynamics during the Double Laser Recrystallization of Amorphous Silicon Thin Films [O] . Minghong Lee, Seungjae Moon, Costas P. Grigoropoulos 2001

• 1. Spatially-Resolved Crystallization of Amorphous Silicon Films on the Glass Substrate by Multi-beam Laser Interference [J] . Zhongfan LIU ,Xuede YUAN ,Xue HAO . 材料科学技术：英文版 . 2007,第4期
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