首页> 外国专利> AQUEOUS BATH AND METHOD FOR ELECTROLYTICALLY DEPOSITING COPPER LAYERS

AQUEOUS BATH AND METHOD FOR ELECTROLYTICALLY DEPOSITING COPPER LAYERS

机译:电解沉积铜层的水浴和方法

摘要

For the uniform electrolytic deposition of copper coatings, especially on printed circuit boards, an aqueous deposition bath is used which contains as constituents at least one source of copper ions, at least one compound increasing the electrical conductivity of the deposition bath as well as at least one additive, at least one transformation product, formed from epihalohydrins, dihalohydrins or respectively 1-halogen-2,3-propanediols and polyamidoamines being contained as the additive. The polyamidoamines are formed by the condensation reaction of dicarboxylic acids with polyalkylene polyamines. When copper coatings are deposited from this bath, copper layers of uniform layer thickness can be deposited.
机译:为了均匀地电解沉积铜涂层,特别是在印刷电路板上,使用含水沉积浴,其包含至少一种铜离子源,至少一种增加沉积浴电导率的化合物作为成分。作为添加剂,包含由表卤代醇,二卤代醇或分别由1-卤素-2,3-丙二醇和聚酰胺型胺形成的一种添加剂,至少一种转化产物。通过二羧酸与聚亚烷基多胺的缩合反应形成聚酰胺基胺。当从该浴中沉积铜涂层时,可以沉积均匀厚度的铜层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号