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AN ACIDIC OZONE SOLUTION HAVING A HIGH OZONE CONTENT, A METHOD FOR PREPARING THE SOLUTION, AND A CLEANING METHOD USING THE SOLUTION
AN ACIDIC OZONE SOLUTION HAVING A HIGH OZONE CONTENT, A METHOD FOR PREPARING THE SOLUTION, AND A CLEANING METHOD USING THE SOLUTION
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机译：具有高臭氧含量的酸性臭氧溶液，一种制备溶液的方法以及一种使用该溶液的清洁方法
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摘要
The present invention relates to an acidic ozone solution having a high concentration of ozone, a method for preparing the solution by injecting ozone into an acid, and a method for cleaning single crystal silicon wafers using the solution.
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