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Low-noise-low-frequency vertical transistor with high current gain and corresponding method

机译:具有高电流增益的低噪声低频垂直晶体管及其方法

摘要

Preparation of a bipolar vertical transistor comprises: (a) making an intrinsic collector on a layer of extrinsic collector in a semiconductor substrate; (b) making a lateral isolating region; (c) making a base next to he intrinsic collector and the lateral isolating region; and (d) making a bipartite dope emitter in situ. Preparation of a bipolar vertical transistor comprises: (a) making an intrinsic collector (4) on a layer of extrinsic collector (2) in a semiconductor substrate (1); (b) making a lateral isolating region (5) surrounding the upper part of the intrinsic collector and of wells of the imprisoned extrinsic collector (60); (c) making a base (8) next to he intrinsic collector and the lateral isolating region and comprising a non-selective epitaxy of a semiconductor region (8) comprising at least one layer of silicon; (d) making a bipartite dope emitter (11) in situ comprising: (i) making a first layer (110) of the emitter formed from microcrystalline silicon and directly in contact with a part (800) of the upper surface of the semiconductor region situated on top of the intrinsic collector; and (ii) making a second part (111) of emitter from polycrystalline silicon; the two parts (110, 111) being separated by an oxide layer (112).
机译:双极型垂直晶体管的制备包括:(a)在半导体衬底中的非本征集电极层上制备本征集电极; (b)形成一个横向隔离区; (c)在本征收集器和横向隔离区旁边做一个基极; (d)原位制作二元掺杂发射极。双极型垂直晶体管的制备包括:(a)在半导体衬底(1)中的非本征集电极(2)层上制备本征集电极(4); (b)围绕本征收集器的上部和受禁非本征收集器(60)的井的周围形成一个横向隔离区域(5); (c)在本征集电极和横向隔离区的旁边制作一个基极(8),并包括至少包括一层硅的半导体区(8)的非选择性外延; (d)原位制造二部分掺杂发射极(11),包括:(i)制作由微晶硅形成并直接与半导体区域上表面的一部分(800)接触的发射极的第一层(110)。位于内在收集器的顶部; (ii)由多晶硅制成发射极的第二部分(111);两个部分(110、111)被氧化层(112)隔开。

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