(wherein, X and Y denote independently each other saturated or unsaturated hydrocarbon radicals with from 1 to 6 carbon atoms, alkoxy radicals, alkenyloxy radicals, alkynyloxy radicals, substituted or unsubstituted aryl radicals, or substituted or unsubstituted heterocycles, and from R1 to R4 denote independently each other hydrogen, halogens, substituted or unsubstituted alkyl radicals with from 1 to 6 carbon atoms, alkoxy radicals, perfluoroalkyl radicals, perfluoroalkoxy radicals, amino radical, alkylcarbonyl radicals, alkoxycarbonyl radicals, formyl radical, nitroso radical, azo radical, alkylcarbonyloxy radicals, alkoxycarbonyloxy radicals, formyloxy radicals, supinely radical, sulfonyl radical, sulfanil radical, silyl radical, isocyano radical, carbamoyl radical, cyanate radical, isocyanate radical, thiocyanate radical, isothiocyanate radical, aryl radicals, alkenyl radicals, alkynyl radicals or cyano radical or substituted or unsubstituted condensed rings in the case of being adjacent) is used as a component of a hole-obstructing layer."/>
公开/公告号EP1143538A1
专利类型
公开/公告日2001-10-10
原文格式PDF
申请/专利权人 CHISSO CORPORATION;
申请/专利号EP20010113156
申请日1996-07-08
分类号H01L51/20;H01L51/30;
国家 EP
入库时间 2022-08-22 01:14:49