METHOD OF MAKING SHIELD AND PLASMA ETCHING APPARATUS FOR ENHANCED INDUCTIVE COUPLING TO PLASMAS WITH REDUCED SPUTTER CONTAMINATION

摘要

Method of manufacturing a shield plate to remove the spa emitter sources insulating window of the present invention after performing the etching process in the plasma etching apparatus in the absence of the shield plate, and samples the etched regions formed on the insulating window, the sampled etched region and to form a corresponding shielding film constitutes the shielding plate. The plasma etching apparatus of the present invention, the shielding film corresponding to the shape of the coil is formed in the shielding plate is provided with an opening corresponding to the clearance between the coil. The shielding plate is provided with an insulating window position on one side of the process chamber is grounded between the coils located outside the insulating surface of the window.