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Gas sensors for sulfur compound gas detection and their fabrication method with CuO addition by dual lon beam sputtering

机译:用于硫化合物气体检测的气体传感器及其双离子束溅射添加CuO的制造方法

摘要

The present invention relates to as making a semiconductor type gas sensor sensitive to the sulfur compound gas, n-type semiconductor-type thin film form of SnO 2, or by the addition of CuO with a dual ion beam sputtering over ZnO at low concentrations in the ppm or less by making the double junction structure in manufacturing a substrate, consisting of a heater, an electrode, n-type oxide semiconductor and the p-type pn junction of the oxide semiconductor to heat the sensor the gas sensor related to a method for producing a detection layer having a high sensitivity, on an insulating substrate n-type oxide is formed, and wherein the thickness by a dual ion beam sputtering on the surface of the semiconductor clad 0.1~20nm range of CuO thin film, in the hydrogen sulfide sensor element, SnO2, or in the range of the thickness on the substrate 10nm~1000nm the n-type oxide semiconductor layer of ZnO is formed, a dual ion beam sputtering on the n-type oxide semiconductor layer Thickness of the formed thin film by ringbeop 0.1~20nm range of CuO, these n-type oxide semiconductor layer and the CuO layer is repeated three times at one time, two electrodes may be formed on the same surface of the substrate formed on the top floor and that is characterized.
机译:本发明涉及作为使半导体型气体传感器对硫化合物气体敏感的方法,涉及SnO 2 的n型半导体型薄膜形式,或者通过在双离子束中添加CuO来实现。在制造衬底的双结结构中,以ppm或更低的浓度在ZnO上进行溅射,该结构由加热器,电极,n型氧化物半导体和氧化物半导体的p型pn结组成,以加热传感器该气体传感器涉及在绝缘性基板上形成具有高灵敏度的检测层的方法的n型氧化物,并且其中,通过双离子束溅射在覆有半导体的表面上形成的厚度为0.1〜20nm的范围。在硫化氢传感器元件中,将CuO薄膜SnO2或在衬底上的厚度范围10nm〜1000nm内形成ZnO的n型氧化物半导体层,在n型氧化物半导体上进行双离子束溅射Thic层通过环氧化0.1〜20nm范围的CuO形成的薄膜的厚度,将这些n型氧化物半导体层和CuO层一次重复3次,可以在形成于顶部的基板的同一面上形成两个电极。地板的特点。

著录项

  • 公开/公告号KR100305660B1

    专利类型

  • 公开/公告日2001-09-26

    原文格式PDF

  • 申请/专利权人 NULL NULL;

    申请/专利号KR19990004453

  • 发明设计人 최용삼;정재호;김대승;

    申请日1999-02-09

  • 分类号H01L29/84;

  • 国家 KR

  • 入库时间 2022-08-22 01:12:04

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