Imagewise thermoresists exposure for manufacture of integrated circuits, involves performing two dimensional scanning of image of light valve across surface of resist with optical system set at different focus settings

摘要

Method for imagewise exposing resists involves illuminating a light valve (11) using a laser to form image of light valve on substrate which is covered with thin layer of thermoresist (9). The image of light valve is scanned two or more times by 2D scanning across the surface of resist with the optical system set at different focus settings.