首页> 外国专利> Production of a solid body having a microstructure comprises diffusing a material into a substrate region covered by a masking layer, removing the masking layer

Production of a solid body having a microstructure comprises diffusing a material into a substrate region covered by a masking layer, removing the masking layer

机译:具有微结构的固体的生产包括将材料扩散到被掩模层覆盖的衬底区域中,去除掩模层。

摘要

Production of a solid body (1) having a microstructure comprises diffusing a material into a substrate region covered by a masking layer so that a drop in concentration of the material occurs from the edge of the masking layer into the substrate region covered by the masking layer. Process then comprises: removing the masking layer to expose the substrate region below; converting a layer of the substrate near to the exposed substrate region into a coating (9) with a corresponding layer thickness progression; reducing a partial region of the coating; and exposing the substrate region covered by a partial region and/or inserting a material in the substrate region through the coating. The masking layers are removed by covering the substrate regions laterally bordering the masking layer with an etching mask, and contacting the mask with an etching agent so that a layer of the substrate regions to be covered with the etching mask is converted into an etching mask material.
机译:具有微结构的固体(1)的制造包括将材料扩散到被掩膜层覆盖的基板区域中,使得材料浓度从掩膜层的边缘进入被掩膜层覆盖的基板区域中而下降。 。然后,该工艺包括:去除掩模层以暴露下面的衬底区域;将靠近暴露的衬底区域的衬底层转换成具有相应的层厚度级数的涂层(9);减少涂层的局部区域;暴露被部分区域覆盖的衬底区域和/或通过涂层将材料插入衬底区域中。通过用蚀刻掩模覆盖与掩模层横向相邻的基板区域,并使掩模与蚀刻剂接触,从而将要被蚀刻掩模覆盖的基板区域的层转换成蚀刻掩模材料,从而去除掩模层。 。

著录项

  • 公开/公告号DE19959346A1

    专利类型

  • 公开/公告日2001-06-21

    原文格式PDF

  • 申请/专利权人 MICRONAS GMBH;

    申请/专利号DE1999159346

  • 发明设计人 IGEL GUENTER;LEHMANN MIRKO;

    申请日1999-12-09

  • 分类号H01L21/225;H01L21/336;

  • 国家 DE

  • 入库时间 2022-08-22 01:10:06

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