首页> 外国专利> Electrode assembly, cathode device and plating apparatus including a gap configured to eliminate a concentration of a line of electrical force at a boundary between a cathode and plate forming surface of an object

Electrode assembly, cathode device and plating apparatus including a gap configured to eliminate a concentration of a line of electrical force at a boundary between a cathode and plate forming surface of an object

机译:电极组件,阴极装置和电镀装置,包括间隙,该间隙构造成消除在阴极和物体的板形成表面之间的边界处的电力线的集中

摘要

An electrode assembly including a first cathode member provided with a hole enclosed by a frame portion. The frame portion surrounding the hole has a contact surface that comes into contact with an object to be plated at one of its surfaces, and an insulating member is provided with holes and enclosed by a frame portion, with one surface of the frame portion placed on top of another surface of the frame portion of the first cathode member. A second cathode member also provided with a hole enclosed by a frame portion, with one surface of the frame portion placed on top of one surface of the other frame portion of the insulating member. The smallest bore diameter at the hole of the second cathode member is larger than the smallest bore diameter at the holes and of the insulating member.
机译:一种电极组件,包括第一阴极构件,该第一阴极构件设置有被框架部分包围的孔。包围孔的框架部分在其一个表面上具有与待镀覆对象接触的接触表面,并且绝缘构件设置有孔并被框架部分包围,框架部分的一个表面放置在该绝缘构件上。第一阴极构件的框架部分的另一表面的顶部。第二阴极构件还设有由框架部分包围的孔,该框架部分的一个表面位于绝缘构件的另一框架部分的一个表面的顶部。第二阴极构件的孔处的最小孔径大于绝缘构件的孔处的最小孔径。

著录项

  • 公开/公告号US06184613B2

    专利类型

  • 公开/公告日2001-02-06

    原文格式PDF

  • 申请/专利权人

    申请/专利号US09152787

  • 发明设计人 TOYOAKI TANAKA;SATOSHI INOUE;

    申请日1998-09-14

  • 分类号H01J12/00;

  • 国家 US

  • 入库时间 2022-08-22 01:07:25

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