Photoresist composition containing photobase generator and photoacid generator

摘要

A photoresist composition comprises (a) a photoresist resin, (b) a photo acid generator, (c) an organic solvent and (d) a photo base generator. The photo base generator is preferably selected from benzyloxycarbonyl compound of Chemical Formula 1 or O-acyloxime compound of Chemical Formula 2. The photobase generator prevents formation of a sloping pattern formation and a severe I/D Bias occurrence. EMI ID=3.1 HE=64 WI=48 LX=417 LY=1006 TI=CF PC```wherein, R', RSB1/SB to RSB6/SB are defined in accordance with the Specification.