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Method for forming a perovskite thin film using a sputtering method with a fully oxidized perovskite target
Method for forming a perovskite thin film using a sputtering method with a fully oxidized perovskite target
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机译:使用溅射法形成具有完全氧化的钙钛矿靶的钙钛矿薄膜的方法
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摘要
An inventive method for forming a thin film comprises the steps of preparing a sputter-target of a material which is fully oxidized and crystallized to a perovskite structure, sputter-depositing a thin film on top of a sample with the target in an inert gas atmosphere, and annealing the thin film in non-oxygen ambient. With the use of such a target, it is possible to reduce the negative ion effect during the sputter deposition and to eliminate the presence of oxygen during the annealing process.
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