首页>
外国专利>
Method of depositing and amorphous fluorocarbon film using HDP-CVD
Method of depositing and amorphous fluorocarbon film using HDP-CVD
展开▼
机译:使用HDP-CVD沉积非晶碳氟化合物膜的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention provides a method of depositing an amorphous fluorocarbon film using a high bias power applied to the substrate on which the material is deposited. The invention contemplates flowing a carbon precursor at rate and at a power level so that equal same molar ratios of a carbon source is available to bind the fragmented fluorine in the film thereby improving film quality while also enabling improved gap fill performance. The invention further provides for improved adhesion of the amorphous fluorocarbon film to metal surfaces by first depositing a metal or TiN adhesion layer on the metal surfaces and then stuffing the surface of the deposited adhesion layer with nitrogen. Adhesion is further improved by coating the chamber walls with silicon nitride or silicon oxynitride.
展开▼