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Process for preparing polycrystalline thin film, process for preparing oxide superconductor, and apparatus therefor

机译:多晶薄膜的制备方法,氧化物超导体的制备方法及其装置

摘要

A method is presented for making a polycrystalline thin film (B) by depositing particles emitted from a target (36) on a substrate base (A) to form the film (B) constituted by the target material while concurrently irradiating the depositing particles with an ion beam generated by an ion source (39) at an angle of incidence, in a range of 50 to 60 degrees to a normal (H) to a film surface, and maintaining a film temperature at less than 300 degrees Celsius. This method is effective in producing an excellent alignment of crystal axes of the grains in the film when the film thickness exceeds 200 nm. The target material includes yttrium-stabilized zirconia but other material can also be used. A layer (C) of a superconducting substance formed on top of the polycrystalline thin film (B) produces a superconducting film (22) exhibiting excellent superconducting properties.
机译:提出了一种通过将从靶( 36 )发射的颗粒沉积在基板基底(A)上以形成由靶材料构成的膜(B)的方法来制造多晶薄膜(B)的方法。同时用离子源( 39 )产生的离子束以与膜表面法线(H)成50至60度的入射角照射沉积粒子,并且保持薄膜温度低于300摄氏度。当膜厚度超过200nm时,该方法有效地产生膜中晶粒的晶轴的优异取向。目标材料包括钇稳定的氧化锆,但也可以使用其他材料。在多晶薄膜(B)的顶部上形成的超导物质层(C)产生表现出优异的超导性能的超导膜( 22 )。

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