首页>
外国专利>
Method of patterning photoresist using precision and non-precision techniques
Method of patterning photoresist using precision and non-precision techniques
展开▼
机译:使用精密和非精密技术对光刻胶进行构图的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method for patterning a layer of photoresist includes the steps of 1) exposing the photoresist through a standard precision mask to define all possible patterns and features, and 2) selecting desired patterns and features with a non-precision targeting energy beam or mask. Consequently, no custom precision masks are required to pattern the various layers of photoresist during the fabrication of application specific integrated circuits (ASICs), thereby reducing both the lead-time and costs for manufacturing ASICs.
展开▼