首页> 外国专利> Chemical vapor deposition of near net shape monolithic ceramic parts

Chemical vapor deposition of near net shape monolithic ceramic parts

机译:近净形整体陶瓷零件的化学气相沉积

摘要

A method and apparatus for producing a coating or a near net shaped monolithic ceramic part by chemical vapor deposition, where the resultant coatings or parts consume less deposit material and require less machining. Mandrel substrates are closely designed for producing a specific, near net shaped final part, including negative relief features. Several of the mandrel substrates are mounted through centers in a spaced relationship on one or more rotable shafts as tooling for a chemical vapor deposition furnace. The tooling is installed in a chemical vapor deposition furnace so that the shafts are oriented perpendicular and the substrate planar surfaces are parallel to the flow pattern of reactant gases through the furnace. The shafts are rotated during the deposition process so that the mandrel substrates each receive a uniformly distributed ceramic deposit in the near net shape of the final part.
机译:一种通过化学气相沉积生产涂层或接近最终形状的整体陶瓷部件的方法和设备,其中所得涂层或部件消耗较少的沉积材料并且需要较少的机加工。心轴基板经过精心设计,可生产出特定的,接近最终形状的最终零件,包括负浮雕特征。几个心轴衬底以一定的间隔关系通过中心安装在一个或多个可旋转的轴上,作为化学气相沉积炉的工具。该工具安装在化学气相沉积炉中,以使轴垂直定向,并且基板平面平行于反应气通过炉的流动方式。在沉积过程中使轴旋转,以使每个心轴基板均以最终部件的近净形状接收均匀分布的陶瓷沉积物。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号