Stage control method and stage and exposure apparatus using the stage control method

摘要

A high precision scanning positioning system with magnification and orthogonality correction, a scanning stage device, such as a micro lithography system, is attached to a fine grained stage and plate microtrellis mounted on a coarse motion stage at constant velocity during exposure Have a shelf. An increase or decrease in magnification can be achieved by moving one fine movement stage to the other fine stage at the same time as the scanning or the opposite direction during exposure of the plate. Similarly, by changing one fine motion stage to the other microtremor in the direction of the scan during exposure, it is possible to achieve orthogonality change and also rotate one fine stage to the other stage Thus, any correction of the rotation error can be achieved. By controlling the movement of the microtremor stage to other microtremor stages, the positioning control system corrects the synchronization error between the fine motion stages while changing the magnification and orthogonalityThe settling time can be reduced simultaneously.