Leveling meting face measurement manner and exposure device

摘要

PURPOSE:To measure the amount of inclination of the levelling mating plane against the best image formation plane in a highly precise and speedy manner without using a special superflat wafer. CONSTITUTION:On the first exposure region 32 on which focal position is provided on the first focal position wherein a levelling mechanism is in operation, five focal-point measuring mask image (ULA, etc.) are exposed on shot regions 33A to 33G which are partially overlapped, and also five focal-point measuring mask images are exposed on the partially overlapped shot region on the exposure regions 34, 36... where the focal position is changed. The best focal position is calculated using the average value of the mask length of mask images ULA to ULG and the mask length of the mark image of the measuring point on the upper left of the first focal position.