DIFFUSEDLY JOINED TARGET ASSEMBLAGE OF HIGH PURITY COBALT TARGET WITH BACKING PLATE MADE OF COPPER ALLOY, AND ITS PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a diffusedly joined target assemblage of a high purity cobalt target with a backing plate with which a high purity cobalt ferromagnetic target can effectively be sputtered, and the occurrence of warpage and peeling can be prevented even at the time of being joined with the backing plate and in the severe conditions of high power sputtering, and to provide its production method.;SOLUTION: In this diffusedly joined target assemblage of the high purity cobalt target with the copper alloy backing plate, diffusion joining is performed with an aluminum or aluminum alloy sheet with a thickness of ≥0.5 mm as an insert material.;COPYRIGHT: (C)2002,JPO