Normal pressure high temperature processing device and its vapor displacement manner

摘要

PURPOSE: To enhance an atmospheric pressure high-temperature processing device in heat resistance, pressure resistance, and sealing properties so as to enable it to be exhausted and then filled with gas. ;CONSTITUTION: A cap 14 is provided to a processing chamber 4 wherein works W contained in a work housing boat 8 are thermally treated at high temperatures under the atmospheric pressure through the intermediary of a first high-temperature heat-resistant sealing means 32. An exhaust system 64 is connected to the exhaust port 26 of the processing chamber 4 through the intermediary of a second high-temperature heat-resistant sealing means 62, and a vacuum pump 78 is provided to the exhaust system 64 for replacing gas. In a gas replacing operation carried out before a process starts, air is exhausted from the processing chamber 4 by the vacuum pump 78, and inert gas is introduced into the reaction chamber 4 for replacing air when the reaction chamber is exhausted as high in degree of vacuum as prescribed.;COPYRIGHT: (C)1995,JPO