Dura mater treatment agent and dura mater processing method null of photoresist patterning

摘要

PURPOSE: To obtain water resistance and etching resistance comparable with hardening agents containing highly concentrated chromium high in toxicity by using a zirconium-containing compound as an effective component without using any chromium-containing hardening agent. ;CONSTITUTION: A water-soluble photoresists coating film formed on a substrate to be etched and imagewise exposed to active light, and developed to form the photoresist patterned film is hardened with the hardening agent containing zirconium as the effective component, this permitting the obtained transparent or light yellow patterned film to have extremely superior corrosion resistance and etching resistance to generally used metal etching solutions, such as aqueous solutions of ferric chloride or chloropersulfate, and to be comparable with the film hardened with an aqueous solution of Cr(VI) oxide.;COPYRIGHT: (C)1994,JPO