首页> 外国专利> Low pressure air particulate sampling system and particulate instrumentation system and chemical reaction device and CVD device and etching device

Low pressure air particulate sampling system and particulate instrumentation system and chemical reaction device and CVD device and etching device

机译:低压空气颗粒物采样系统,颗粒物仪器系统,化学反应装置,CVD装置和蚀刻装置

摘要

PURPOSE:To realize a minute-particle sampling system, in the low-pressure air, wherein a gas which contains minute particles is sampled from a low- pressure reaction chamber and it is sent out at a steady flow rate and at atmospheric pressure. CONSTITUTION:A system is constituted of a low-pressure sampling system 1, of a volume-variable storage container 2, of a vacuum evacuation system, of a clean-gas supply system, of a pressure and temperature, detection mechanism and of a computer system 4. A pressure inside the low-pressure sampling system is lowered by a reaction chamber 26, and a gas containing minute particles is sampled. The gas containing the minute particles is diluted with a clean gas 9, it is returned to atmospheric pressure, it is then sent to a volume- variable storage chamber 2 and it is sent to a minute-particle analyzer 28.
机译:目的:为了在低压空气中实现微小颗粒采样系统,其中从低压反应室中采样包含微小颗粒的气体,并以稳定的流量和大气压将其排出。组成:一个系统由低压采样系统1,容量可变的存储容器2,真空排气系统,清洁气体供应系统,压力和温度,检测机构和计算机组成。系统4。通过反应室26降低低压采样系统内部的压力,并且采样包含微小颗粒的气体。包含微小颗粒的气体用清洁气体9稀释,使其恢复到大气压,然后被送至体积可变的储存室2,然后被送至微小颗粒分析器28。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号