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Low pressure air particulate sampling system and particulate instrumentation system and chemical reaction device and CVD device and etching device
Low pressure air particulate sampling system and particulate instrumentation system and chemical reaction device and CVD device and etching device
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机译:低压空气颗粒物采样系统,颗粒物仪器系统,化学反应装置,CVD装置和蚀刻装置
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摘要
PURPOSE:To realize a minute-particle sampling system, in the low-pressure air, wherein a gas which contains minute particles is sampled from a low- pressure reaction chamber and it is sent out at a steady flow rate and at atmospheric pressure. CONSTITUTION:A system is constituted of a low-pressure sampling system 1, of a volume-variable storage container 2, of a vacuum evacuation system, of a clean-gas supply system, of a pressure and temperature, detection mechanism and of a computer system 4. A pressure inside the low-pressure sampling system is lowered by a reaction chamber 26, and a gas containing minute particles is sampled. The gas containing the minute particles is diluted with a clean gas 9, it is returned to atmospheric pressure, it is then sent to a volume- variable storage chamber 2 and it is sent to a minute-particle analyzer 28.
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