Method and apparatus for continuously forming a functional deposited film with a large area by the microwave plasma CVD method

摘要

PURPOSE: To form a high-quality functional deposit film which is uniform in the large area by constituting a film forming chamber sidewall of a continuously shifting strip-shaped member, introducing a microwave antenna means into the film forming chamber by wrapping the means with a microwave permeating member and generating microwave plasma which is uniform in the longitudinal direction. ;CONSTITUTION: A film forming chamber 104 is evacuated by a vacuum pump through a slit opening 110 and an evacuation port 107. When the pressure in the film forming chamber reaches 1×10^-6-Torr, gaseous raw material whose flow is controlled by a mass flow controller is blown out from a small port 105 through a bias applying tube which is also used as a gaseous raw material introducing tube. Then, the gaseous raw material is introduced into the film forming chamber 104. When the pressure in the film forming chamber reaches the prescribed pressure under such conditions, microwave power is applied to the film forming chamber inside through a square waveguide, a waveguide uniaxial converter, a central conductor 102, a microwave permeating dielectric 103 and a plasma control means 501.;COPYRIGHT: (C)1994,JPO