METHOD OF COMPUTING ABSORBED-ENERGY DISTRIBUTION OF CHARGED-BEAM EXPOSURE, SIMULATOR, CHARGED-BEAM EXPOSURE METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MASK AND RECORDING MEDIUM FOR RECORDING PROGRAM FOR COMPUTATION OF ABSORBED- ENERGY DISTRIBUTION OF CHARGED-BEAM EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a method of computing the absorbed-energy distribution of charged beams, by which process prediction having high accuracy in charged-beam exposure is realized.;SOLUTION: The irradiation conditions of a plurality of substances constituting an irradiated substrate and charged beams are input, and the first substance is specified from the substances. Monte Carlo computing method is conducted when there is only the first substance, and the first energy distribution in the first substance is obtained. When this distribution is functionally approximated, the first scattering parameter can be computed accurately. Monte Carlo computing method is conducted regarding the irradiated substrate, and the second energy distribution in the first substance is obtained. When a third energy distribution is obtained by subtracting the first distribution from the second distribution, and functionally approximating the third distribution, the second scattering parameter can also be computed accurately.;COPYRIGHT: (C)2002,JPO