首页> 外国专利> PRODUCTION METHOD FOR Ga-DOPED SILICON SINGLE CRYSTAL, THE Ga-DOPED SILICON SINGLE CRYSTAL, AND SILICON SINGLE CRYSTAL SOLAR CELL MADE OF THE SAME

PRODUCTION METHOD FOR Ga-DOPED SILICON SINGLE CRYSTAL, THE Ga-DOPED SILICON SINGLE CRYSTAL, AND SILICON SINGLE CRYSTAL SOLAR CELL MADE OF THE SAME

机译:Ga掺杂的硅单晶,Ga掺杂的硅单晶和硅单晶太阳能电池的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a production method for a Ga-doped silicon single crystal capable of suppressing the occurrence of OSF(oxidation-induced stacking fault) due to a heavy metal in the subject crystal useful as the material for a solar cell, and also provide the Ga-doped silicon single crystal for the solar cell having no optical degradation and a high photoelectric conversion efficiency and a silicon single crystal solar cell made of the same.;SOLUTION: This method comprises doping gallium in a silicon single crystal, adding the smaller amount of aluminum than that of gallium and growing the single crystal by a CZ method to produce the Ga-doped silicon single crystal. The obtained silicon single crystal is added with gallium as a dopant, the concentration of gallium contained in the crystal is 5×1017-3×1015 atoms/cm3, and aluminum is added in the lower concentration than that of gallium.;COPYRIGHT: (C)2002,JPO
机译:要解决的问题:提供一种Ga掺杂的硅单晶的制造方法,该方法能够抑制由于用作太阳能电池材料的目标晶体中的重金属导致的OSF(氧化引起的堆垛层错)的发生,并且还提供了一种Ga掺杂的单晶硅太阳能电池,该单晶硅没有光降解并且具有高的光电转换效率;以及由其制成的单晶硅太阳能电池。解决方案:该方法包括在单晶硅中掺杂镓,加入比镓少的铝,并通过CZ方法生长单晶以生产掺Ga的硅单晶。向获得的硅单晶中添加镓作为掺杂剂,晶体中所含镓的浓度为5×1017-3×1015原子/ cm3,铝的添加浓度低于镓的浓度。 C)2002年

著录项

  • 公开/公告号JP2002047095A

    专利类型

  • 公开/公告日2002-02-12

    原文格式PDF

  • 申请/专利权人 SHIN ETSU HANDOTAI CO LTD;SHIN ETSU CHEM CO LTD;

    申请/专利号JP20000231535

  • 发明设计人 TSUDA NOBUHIRO;

    申请日2000-07-31

  • 分类号C30B29/06;C30B15/04;H01L21/208;H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-22 00:58:14

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