MICROMACHINE MANUFACTURING DEVICE, MANUFACTURING METHOD FOR MICROMACHINE, MANUFACTURING METHOD FOR DIFFRACTION GRATING LIGHT VALVE AND MANUFACTURING METHOD FOR DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To improve etching uniformity and prevent delay of etching reaction due to natural oxide film generated on a polysilicon surface in etching of polysilicon using XeF2 gas.;SOLUTION: This device is provided with a processing chamber 11 for etching a substrate 91, a microwave generator 21 feeding etching gas excited by microwave into the processing chamber 11, and a gas feeder 31 feeding xenon difluoride gas into the processing chamber 11.;COPYRIGHT: (C)2002,JPO