首页> 外国专利> Fe-Ni BASED ALLOY FOR PRESS FORMING DIE FLAT MASK AND FLAT MASK AND COLOR CATHODE-RAY TUBE USING THE SAME

Fe-Ni BASED ALLOY FOR PRESS FORMING DIE FLAT MASK AND FLAT MASK AND COLOR CATHODE-RAY TUBE USING THE SAME

机译:基于Fe-Ni的合金模压平口膜,平口膜和彩色阴极射线管的合金

摘要

PROBLEM TO BE SOLVED: To develop an Fe-Ni based alloy for a press forming die perfect flat mask improved in strength (falling impact deformation resistance) and having low thermal expansibility.;SOLUTION: This Fe-Ni based alloy for a press forming die perfect flat mask maintaining low thermal expansibility, and whose proof stress and Young's modulus are improved as well has a composition containing 33 to 37% Ni and 0.001 to 0.1% Mn, voluntarily containing 0.01 to 2% Co and further containing one or more kinds selected from 0.01 to 0.8% Nb, 0.01 to 0.8% Ta and 0.01 to 0.8% Hf by 0.01 to 0.8% in total, and the balance Fe with inevitable impurities, in which, preferably, as the impurities, C is controlled to ≤0.01%, Si to ≤0.04%, P to ≤0.01%, S to ≤0.01% and N to ≤0.005%. The flat mask and color cathode-ray tube use the same.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:开发一种用于压制成型模具的Fe-Ni基合金完美的平面掩模,其强度(抗冲击变形变形性)提高且热膨胀率低。完美的平面掩模,保持低的热膨胀性,并且其屈服应力和杨氏模量也得到改善,其组成包含33%到37%的Ni和0.001%到0.1%的Mn,自愿包含0.01%到<2%的Co,还包含一种或多种选自0.01至0.8%的Nb,0.01至0.8%的Ta和0.01至0.8%的Hf,合计0.01至0.8%,余量的Fe具有不可避免的杂质,其中优选将C作为杂质控制为&le; 0.01%,Si达到0.04%,P达到0.01%,S达到0.01%,N达到0.005%。平面掩膜和彩色阴极射线管使用相同。版权所有:(C)2002,日本特许厅

著录项

  • 公开/公告号JP2002080939A

    专利类型

  • 公开/公告日2002-03-22

    原文格式PDF

  • 申请/专利权人 NIPPON MINING & METALS CO LTD;

    申请/专利号JP20010089616

  • 发明设计人 ETO MASATOSHI;MORI MASAZUMI;

    申请日2001-03-27

  • 分类号C22C38/00;C22C38/12;H01J9/14;H01J29/07;

  • 国家 JP

  • 入库时间 2022-08-22 00:57:39

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